China High quality Aluminum Sputtering Target Quotes, Factory, Manufacturers

Aluminum Sputtering Target

Brand :Xinkang

Product origin :Hunan,China

Delivery time :1-3 weeks

Supply capacity :1-2 tons / month

Aluminum Sputtering Targets are produced by melting technology, usually applled for optical coating and semiconductor field. With up to 5N purity, uniform grain size, lower oxygen content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.



Chemical Composition: pure Al

Available Purity: 2N5, 3N, 4N, 5N, 5N5

Production Technology: melting

Shapes: planar targets, rotary targets

Average Grain Size: < 300um, structure of fine grains can be customized  


Certificate of analysis of 5N high purity aluminum sputtering target

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