China High quality Copper Nickel Sputtering Target Quotes, Factory, Manufacturers

Copper Nickel Sputtering Target

Brand :Xinkang

Product origin :Hunan,China

Delivery time :1-3 weeks

Supply capacity :1-2 tons / month

Copper Nickel Sputtering Target is produced by melting technology, it's usually used for depositing electromagnetic interference (EMI) shielding layer, for the field of electronic products such as smartphone, PAD, and etc. With up to 3N5 purity, uniform grain size, lower oxygen content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.  



Chemical Composition: CuNi 90/10wt%, CuNi 80/20wt%, CuNi 70/30wt%, CuNi 55/44wt%, CuNiMn 60/38/2wt%, CuNiMn 55:44:1wt%

Segregation of weight: +/-0.5wt%

Available Purity: 3N, 3N5

Production Technology: melting

Shapes: planar targets, rotary target

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