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Iron Sputtering Target

Brand :Xinkang

Product origin :Hunan,China

Delivery time :1-3 weeks

Supply capacity :1-2 tons / month

Iron Sputtering Target are produced by melting technology, it can be used for magnetic data storage application. With up to 4N purity, uniform grain size, lower oxygen content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.



Chemical Composition: pure Fe

Available Purity: 3N, 4N

Production Technology: melting

Shapes: planar targets

Average Grain Size: < 100um  


Certificate of analysis of 4N pure Iron Sputtering Target

Certificate of analysis for Fe target.jpg


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