China High quality Molybdenum Sputtering Targets Quotes, Factory, Manufacturers

Molybdenum Sputtering Targets

Brand :Xinkang

Product origin :Hunan,China

Delivery time :1-3 weeks

Supply capacity :1-2 tons / month

Molybdenum Sputtering Target are produced by powder metallurgy technology, as a refractory metal, it has very high melting point, as well as high electrical conductivity, good corrosion resistance and environment friendly, it's widely used for field of TFT-LCD, thin film solar cells and semiconductor fields. With up to 3N5 purity, high density, uniform grain size, lower gas content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.



Chemical Composition: pure Mo

Available Purity: 3N5

Production Technology: powder metallurgy

Shapes: planar targets, rotary targets

Average Grain Size: < 100um  


Certificate of analysis of 3N5 pure Molybdenum Sputtering Target

Certificate of analysis for 99.95% Molybdenum sputtering target.jpg


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