China High quality Nickel Sputtering Target Quotes, Factory, Manufacturers

Nickel Sputtering Target

Brand :Xinkang

Product origin :Hunan,China

Delivery time :1-3 weeks

Supply capacity :1-2 tons / month

Nickel Sputtering Target are produced by melting technology, it usually applied for infrared detectors and magnetic data storage field. High purity nickel is usually applied for semiconductor field. With up to 5N purity, uniform grain size, lower gas content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.



Chemical Composition: pure Ni

Available Purity: 3N5, 4N, 4N5, 5N

Production Technology: melting

Shapes: planar targets, rotary targets

Average Grain Size: < 100um  


Certificate of analysis of 4N pure Nickel Sputtering Target

Certificate of analysis for Ni target.jpg


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